Ion Source IS200
The IS 200 is a differentially pumped extractor type ion source ideally suited for sample cleaning. The low cost source’s sturdy design guarantees stable operating conditions over a long period of time, even with the use of reactive gases. Small spot sizes and a XY-deflection unit (+/- 5 mm) also allow for cleaning SPM tips. High emission currents are provided even at low beam energies, with the primary energy range reaching from 0.2 to 3 keV and working pressures as low as 10-8 mbar. Spot size and current density depend on the distance between source and sample, where the overall length of the IS 200 can be chosen to meet the specific requirements of the concerning UHV chamber.
Ion Source IS200
| Design |
Differentially pumped extractor type ion source with XY-deflection unit |
| Primary energy range |
0.2 – 3 keV |
| Total current |
Typically 15 μA |
| Working pressure |
down to 10-8 mbar |
| Spot size (FWHM) |
0.5 mm (at 30 mm working distance) |
| Mounting flange |
DN 35 CF |
| Insertion depth |
variable |
| Working distance |
variable |
| Bakeable |
up to 250°C |
PS-IS 200 Power Supply
| Display |
Ion energy, extractor voltage, emission current, deflection voltages |
| Dimensions (W x H x D) |
19’’ x 133 mm x 415 mm |
Ion Source IS100
The IS 100 is an extractor type ion source ideally suited for sample cleaning or STM tip cleaning. The low cost source’s sturdy design guarantees stable operating conditions over a long period of time. The Yttrium coated Iridium cathode allows for noble and reactive gas operation. High emission currents are provided even at low beam energies, with the primary energy range reaching from 0.2 to 5 keV and working pressures in the range of 10-5 – 10-6 mbar (direct gas inlet). Spot size and current density depend on the distance between source and sample, where the overall length of the IS 100 can be chosen to meet the specific requirements of the concerning UHV chamber.
IS 100 Ion Source
| Design |
Extractor type ion source |
| Primary energy range |
0.2 – 5 keV |
| Total current |
Typically 15 – 20 μA |
| Working pressure |
10-5 – 10-6 mbar |
| Spot size (FWHM) |
> 4 mm (at > 50 mm working distance and 5 kV) |
| Mounting flange |
DN 35 CF |
| Insertion depth |
variable |
| Working distance |
variable |
| Bakeable |
up to 250°C |
PS-IS 100 Power Supply
| Display |
ion energy |
| Dimensions (W x H x D) |
19’ x 133 mm x 415 mm |
The IS 100 is an extractor type ion source ideally suited for sample cleaning or STM tip cleaning. The low cost source’s sturdy design guarantees stable operating conditions over a long period of time. The Yttrium coated Iridium cathode allows for noble and reactive gas operation. High emission currents are provided even at low beam energies, with the primary energy range reaching from 0.2 to 5 keV and working pressures in the range of 10-5 – 10-6 mbar (direct gas inlet). Spot size and current density depend on the distance between source and sample, where the overall length of the IS 100 can be chosen to meet the specific requirements of the concerning UHV chamber.